A scalable Linear Plasma Source for use in various coating systems. The beam length of the source is determined by the dimensions of the substrate and the width (shorter side of the beam) depends on the thermal load on the extraction grid or on the location and weight of the source.

The shape of the QUATRON-L lends itself for large area coating applications such as glass coating or Roll to Roll (R2R) coating. Applications include (but are not limited to):

• Plasma Surface Treatment
• Plasma Etch / Ion Etch – for example for Nano-Imprint Lithography (NIL)
• Plasma CVD
• Ion Beam Assisted Deposition (IBAD) – i.e. IBAD E-Beam Deposition
• Ion Beam Sputtering

Advantages of the Source: 

• Neutral Plasma Beam – no external neutralization required
• Ion Energy in Beam: 20 to ~ 2,000 eV
• Single Grid Extraction System – no beam focus degeneration during operation and only one consumable part
• Close to Monochrome Energy Distribution with the respective Ion Energy
• Plasma operation with ALL possible gases
• Direct Usage for PA-CVD – Reaction in the Plasma provides high kinetic energy to reactants