The methods of plasma generation and extraction used and patented by HS Group GmbH allow the use of plasma technology in a variety of applications.

Our QUATRON technology is based on four important features that make these plasma source an outstanding tool for versatile use in the industry and in science.

 The four important QUATRON features are:

⇒ Capacitive coupled
⇒ Highly energetic
⇒ Resistance to process-related pollution (no glass bodies)
⇒ All process gases, including reactive gases, can be used

The QUATRON sources’ unique arrangement of capacitively coupled plasma cup with axis aligned magnetic coils allow a high degree of control for 

⇒ Ion Energy – the energy of the extracted ions is concentrated in a very narrow band
⇒ Ion Current
⇒ Plasma Beam Focus

A conversion of our plasma sources to different frequencies, for example, 13.56 MHz, 27.12 MHz or 40 MHz is easily possible. Higher frequencies lead to a higher degree of ionization and thus to a higher plasma density, a higher ionic current and higher energy.

The QUATRON Plasma Source can be used for:

⇒ Plasma Surface Treatment
⇒ Ion Assist Processes such as Ion Beam Assisted Electron Beam Deposition (IBAD)
⇒ Ion Etching
⇒ Plasma CVD – the only source that provides a high kinetic energy to the reactants of the CVD process without the need to bias the substrate

More features of our QUATRON plasma sources:

⇒ Neutral and parallel beam (no static charge of the substrate)
⇒ Simple Extraction Grid – only wear part
⇒ Ion energy in the beam exactly adjustable: 20 to ~2,000 eV
⇒ Beam current: up to ~ 6 mA/cm²
⇒ Typical work range/pressure range: 1*10-4 to 5*10-3 mbar
⇒ Very mono-chrome energy distribution in the respective pressure range
⇒ Plasma operation with several gases simultaneously with initial contact (mixing) in the plasma source

With our capacitively coupled plasma sources, both CVD processes and plasma-assisted processes in conventional PVD processes are possible. Typically, the energy range is 20 eV to 2,000 eV and higher.